Surface Analysis (SPM, EPMA)

Scanning Probe Microscope Shimadzu SPM-9700

Model: SPM-9700

Manufacturer: SHIMADZU

Higher performance, faster speeds, and easier operation
Images can be freely rotated, zoomed, and Z-axis magnification varied using the mouse
Up to 8 images can be displayed simultaneously and cross-section profiles can be analyzed in 3D images
With a generous selection of measurement modes, images can be obtained that show other information besides the sample shape
Controller is attached to an environment controlled chamber to control the temperature and humidity inside the chamber
The particle analysis software extracts multiple particles from SPM-9700 image data and calculates feature values for each particle, then analyzes and displays them
Resolution: X, Y: 0.2 nm; Z: 0.01 nm
Light source: Laser diode (ON/OFF)
Detector: Photodetector
Max. sample size: 24 mm dia. x 8 mm

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Model: Shimadzu SPM-8000FM

Manufacturer: SHIMADZU

Achieves the performance level of a vacuum-type SPM, even in air and liquids
Noise in air and liquids is reduced to 1/20th that of existing methods
Uses the FM-AFM (Frequency Modulation - Atomic Force Microscope) method
Maximum 8 images can be displayed simultaneously, cross section shape can be displayed during scanning
Observation parameters can be specified
Resolution: X, Y: 0.2 nm, Z: 0.01 nm
Detector: Photodetector
Light source: Laser diode
Max. scanning size: 2.5 µm × 2.5 µm × 0.3 µm (X, Y, Z)
Max. sample size: 38 mm dia. x 8 mm

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Model: Shimadzu EPMA-1720

Manufacturer: SHIMADZU

High Sensitivity, High Accuracy, High Resolution, and Easy-to-Understand Operation
Both hardware and software incorporate the latest technologies to create the next generation of EPMA
Optimum X-Ray Spectrometer Design Offers Highly Sensitive and Accurate Analysis
Unprecedented Easy Operation Boosts Work Efficiency from SEM Observation to Analysis
Start SEM imaging with a single click
Simple, quick, and accurate adjustment of the beam current, while maintaining focus
Maintains the 52.5° X-ray take-off angle that is fundamental to analytical performance
Magnification: 40× to 400,000×
Electron Source: W (tungsten) filament
Resolution: 1 µm; Secondary-Electron Image Resolution: 6nm

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Model: EPMA-8050G

Manufacturer: SHIMADZU

This instrument is equipped with a cutting-edge FE electron optical system
Ultra High Resolution Mapping
Highest Secondary-Electron Image Resolution of 3 nm
Simple and Easy-to-Understand Operations for All Analyses
Ultra High Sensitivity Mapping
Advanced Technology Enabling Ultra High Sensitivity Analyses of Minute Areas
The system can be equipped with up to five 4-inch X-ray spectrometers which provide both high sensitivity and high resolution.
Electron Source: Schottky emitter
Magnification: 40× to 400,000×
Resolution: 1 µm; Secondary-Electron Image Resolution: 3 nm

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